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Methods of Thin Film Deposition
Published in Fredrick Madaraka Mwema, Tien-Chien Jen, Lin Zhu, Thin Film Coatings, 2022
Fredrick Madaraka Mwema, Tien-Chien Jen, Lin Zhu
PLD can be used for the deposition of a variety of materials; in fact, due to the versatility of the PLD technique, there is almost no restriction on the source (target) materials that can be used. It is mostly used where other deposition methods cannot be utilised and is used to manufacture nanotubes, nanopowders, and quantum dots. It can also be used to synthesise hybrid metal organics, biomaterials, and polymers. It has been used to deposit highly crystalline V2O5 and V6O13 thin films which have potential for applications in energy storage devices [43]. Molybdenum trioxide (MoO3) thin films have also been deposited via the PLD method for photochromic applications [44]. Thin films of MoS2 have been prepared via PLD for low-power and high mobility transistor applications [45].
Thin Coating Technologies and Applications in High-Temperature Solid Oxide Fuel Cells
Published in Sam Zhang, Jyh-Ming Ting, Wan-Yu Wu, Functional Thin Films Technology, 2021
PLD or laser ablation is a physical method of thin film deposition in which a pulsed laser beam, usually of wavelength in the UV range, is employed to ablate a target composed of the desired thin film composition, which is subsequently deposited onto a substrate. The usual range of laser wavelengths for thin film growth by PLD lies between 200 nm and 400 nm for most materials. In PLD, the temperature of the substrate is one of the main parameter affecting atomic surface mobility during the deposition process. PLD enables fabrication of multicomponent stoichiometric films from a single target, and with an appropriate choice of the laser (e.g., Nd:YAG, KrF, XeCl), any material can be ablated and the growth can be carried out in a pressure of any kind of gas, reactive or not. To date, PLD is utilized in the deposition of a wide spectrum of materials, ranging from metals, to polymers, to semiconductors, to insulators, and to biological materials (Huang et al. 2019). Shown in Figure 4.6 is the schematic diagram of a PLD process (Scandurra et al. 2020).
Plasma Synthesis of Nanomaterials
Published in Klaus D. Sattler, st Century Nanoscience – A Handbook, 2019
Antaryami Mohanta, Raj K. Thareja
PLA has widely been used for many different applications of materials processing such as thin films deposition, cluster formation, chemical reactions, and surface modifications (synthesis of nanoclusters) (Miller and Haglan 1998). Pulsed laser deposition (PLD) is one of the versatile techniques for thin film deposition and has been used for deposition of varieties of materials such as metals, semiconductors, and ceramics depending upon the applications (Miller and Haglan 1998). For the synthesis of nanomaterials, nanosecond neodymium-doped yttrium aluminum garnet (Nd: YAG), and excimer lasers have mostly been used (Kim et al. 2017). Femtosecond lasers are also used for nanoparticle generation (Amoruso et al. 2004, Amoruso et al. 2005). The specific mechanism of absorption of laser irradiation by the materials depends on its type, laser pulse width, intensity, and wavelength (Kim et al. 2017, Brown and Arnold 2010). According to the Beer-Lambert law, the intensity of the laser radiation depends on the absorption coefficient α of the material as (Brown and Arnold 2010) I(Z)=I0e−αz
Features of obtaining diamond-like coatings by pulsed laser deposition
Published in Welding International, 2022
A. G. Grigoryants, A. E. Shupenev, A. V. Krivosheev, S. L. Ponomarenko, I. S. Korshunov
The method of pulsed laser deposition is notable for the possibility of producing complex joints of high purity, due to the small size of the heat-affected zone [7], achievable as a result of using short pulses with high duty factor. This makes it possible to exclude impurities introduced by the evolution of gas from the heated parts of the usual evaporative parts [8]. The PLD method consists of physical deposition from the vapour phase, where a powerful pulsed laser beam is focused inside a vacuum chamber onto the surfaces of a target made from the material of the required coating. The formed particles of the products of laser ablation are dispersed in the form of a gas-plasma cloud before deposition on the substrate. Laser treatment is carried out in a vacuum or in the presence of a background gas. A background gas may be used both for controlling the energy spectrum of the deposited particles and for reactive deposition with the aim of obtaining oxides and nitrides [9]. Some process factors have a considerable influence on the parameters of the thin films obtained, in particular on the percentage content of the diamond phase. These factors include: energy density of the radiation [1,10,11], angle of deposition [11], substrate temperature [12], and pressure in the chamber [13]. Production of high-quality coatings requires observation of an optimum combination of these parameters.
Characterisation of AlN nano thin films prepared by PLD
Published in Surface Engineering, 2020
PLD is emerging as a new perspective technique for nanoparticles and thin films deposition, and has been successfully applied to a wide variety of materials [8–12]. Virtually, any material can be deposited using this technique, from pure elements to multicomponents materials. In the PLD process, a film is formed by ablating a solid target with energetic laser pulses. According to its ability to carry the stoichiometry from the target to substrate and to its relatively high growth rate (about 1 nm per pulse), PLD is an attractive technique for complex thin films deposition including AlN thin films deposition [13–17]. However, there have been few research works on AlN nano thin films. In the present study, the effects of PLD conditions such as laser fluence, ambient pressure and substrate temperature on AlN nano films have been systematically investigated.
Bioactive coating as a surface modification technique for biocompatible metallic implants: a review
Published in Journal of Asian Ceramic Societies, 2019
B. Priyadarshini, M. Rama, U. Vijayalakshmi
Various coating techniques have been employed. Mechanical methods such as electrophoretic coating, plasma spray, laser deposition, biomimetic deposition and wet methods such as sol-gel-based spin- and -dip or spray-coating deposition have been used most often for coating implants. The advantage and disadvantages of the various types of coating are listed in Table 2.The Thermal spray method developing in many directions. Probably the most exciting developments in coatings revolve around new applications. Examples include coatings that are applied to new forms of energy generation such as electrolysis, self-cleaning of surfaces by photocatalysis, biomaterials, electronic-based functionalities, and many others.Magnetron sputtering has been used in the process of deposition of industrially important wear-resistant coatings, low-friction coatings, corrosion-resistant coatings, and decorative coatings.The pulsed-laser deposition (PLD) technique is a physical phenomenon employing a laser to ablate a target material and condense it on the surface of a substrate.Ion-beam deposition is used to grow ultra-pure epitaxial thin films at low temperature and produce unique film properties not obtained with conventional deposition methods.