China
Africa
Explore chapters and articles related to this topic
Viruses as Nanomaterials
Published in Devarajan Thangadurai, Saher Islam, Charles Oluwaseun Adetunji, Viral and Antiviral Nanomaterials, 2022
Dushyant R. Dudhagara, Megha S. Gadhvi, Anjana K. Vala
The cysteine-changed TMV has been used in a new process for the formation of battery elements (Gerasopoulos et al. 2010). The modified TMV was prepared on a gold-coated substrate and activated by palladium above a 20 nm thick nickel layer; it was precipitated on the virus surface using dimethylamino borane. An Atomic Layer Deposition (ALD) technique has been utilized to coat the nickel layer with 20 nm of TiO2. ALD is a method for controlling thin film precipitation on surfaces; this method includes injecting two or more chemical vapours or gaseous precursors into a gaseous medium having the target substrate in short pulses. The TMV-based anode was found to have a two-fold higher discharge capacity and can outperform the control planar films at very high currents and cycle numbers; uncommonly, the TMV-based structures remained perfect during such harsh electrical testing. Gerasopoulos et al. (2010) and Royston et al. (2008) hypothesized that increased electrical characteristics can occur because of factors like high surface areas being transmitted through TMV templates.
Ion Beam Analysis: Analytical Applications
Published in Vlado Valković, Low Energy Particle Accelerator-Based Technologies and Their Applications, 2022
In another report, Wielunski et al. (2005) studied ultra-thin films of aluminum oxide and hafnium oxide are currently being explored as high-k gate dielectrics for next-generation CMOS and related devices. Among the many methods to produce such films, atomic layer deposition (ALD) appears very promising as it enables deposition of ultra-thin layers on Si and other substrates with monolayer control. For device applications, it is critical to be able to measure and control the total oxide film thickness, as well as that of the SiO2 that often forms at the high-k/Si interface. The authors showed how Hf, O, AI and Si from ultra-thin oxides could be detected and separated from the Si substrate scattering spectrum. In order to separate the Si substrate signal from the amorphous ultra-thin oxide O, Al and Si signals, ion channeling was applied. While the separation of Al and Si signals from thin oxide layers in typical 2 MeV He RBS is difficult due to the small mass difference, the authors have demonstrated that separating these signals is possible using higher energy scattering, 2.7 MeV.
Standard autologous tissue flaps for whole breast reconstruction
Published in Steven J. Kronowitz, John R. Benson, Maurizio B. Nava, Oncoplastic and Reconstructive Management of the Breast, 2020
Steven J. Kronowitz, John R. Benson, Maurizio B. Nava
There is reasonably consistent anatomy of the neurovascular pedicle which renders the ALD flap extremely reliable and robust. It precludes the need for implant placement and thus avoids any associated complications with fewer additional procedures being required following ALD reconstruction.8 Compared with autologous free tissue transfer from the abdomen, the ALD flap has lower morbidity, shorter hospital stay, and may be more cost-effective.9,10 In addition, it is a safe procedure to use in obese women.11,12
Modeling the antifouling properties of atomic layer deposition surface-modified ceramic nanofiltration membranes
Published in Biofouling, 2022
Welldone Moyo, Nhamo Chaukura, Machawe M. Motsa, Titus A. M. Msagati, Bhekie B. Mamba, Sebastiaan G. J. Heijman, Thabo T. I. Nkambule
Thin film layer coating via the ALD method involves introducing non-overlapping and alternate pulses of precursor gases or vapors and their subsequent chemisorption on the sample. Once all the reactive sites on the substrate surface are occupied, the reaction self terminates. The saturative self-limiting steps in ALD allows for one sub-monolayer growth of film per deposition cycle. Consequently, the ALD method achieves: (1) a uniform thin layer even on large surface area substrates; (2) retention of conformal integrity even on high aspect ratio structures, and (3) judicious control of film thickness. Thus, ALD is suitable for high precision surface functionalization and pore size modification of ceramic membranes. A number of materials including polymers, sulfides, metals and oxides have been deposited on ceramic membranes (Dendooven and Detavernier 2017). However, the majority of previous studies concentrated on applying ALD modification on membranes for gas separation (Park et al. 2006; Kim and Oh 2014). The application of ALD modification for the enhancement of surface hydrophilicity and antifouling properties of ceramic membranes is less studied.
N-acetyl cysteine in the treatment of alcohol use disorder in patients with liver disease: Rationale for further research
Published in Expert Opinion on Investigational Drugs, 2018
Kirsten C. Morley, Andrew Baillie, Wim Van Den Brink, Kate E. Chitty, Kathleen Brady, Sudie E. Back, Devanshi Seth, Greg Sutherland, Lorenzo Leggio, Paul S. Haber
With regards to ALD, disulfiram and oral naltrexone are extensively metabolized by the liver and both are contraindicated in patients with clinically relevant liver diseases [9]. There is some debate in the literature regarding the clinical significance of liver toxicity from naltrexone treatment in ALD [10] particularly in mild cases. However, use is still limited in ALD patients with advanced liver disease and caution is nonetheless still recommended [6]. With regards to acamprosate, although there is no evidence to suggest it is unsafe in the presence of liver disease, the regimen of six tablets per day along with modest efficacy indicates the need for further medication development. While topiramate is a promising agent for reducing heavy drinking days, it may induce hyperammonemia and cause significant changes in hepatic function tests [11]. Moreover, topiramate may be associated with cognitive impairment and mood changes which can confound a diagnosis of hepatic encephalopathy in advanced liver disease [6]. It is thus less ideal for use in ALD patients. Nalmefene could be a potential option for patients with ALD given that it has been reported to have similar efficacy to naltrexone in the treatment of AUD but without documented hepatotoxicity [12]. However, the safety of nalmefene in the case of advanced liver disease is not yet established.
Advances in the treatment of severe alcoholic hepatitis
Published in Current Medical Research and Opinion, 2019
Wenjun Wang, Ying Xu, Chang Jiang, Yanhang Gao
Furthermore, the incidence and development of ALD are affected by many factors. The duration of alcohol intake and amount of ingested alcohol are the most important predictors6. Other factors, such as types of alcoholic beverage ingested, genetics, age and gender, obesity, hepatitis B virus (HBV) or hepatitis C virus (HCV) infection, coexistence of other liver diseases, metabolic syndrome, cumulative alcohol intake, and cigarette smoking, also contribute to the overall risk of developing ALD7. An exploratory genome-wide association study found that the patatin-like phospholipase domain-containing protein 3 (PNPLA3) single-nucleotide polymorphism rs738409 was associated with risk for AH8.