China
Africa
Explore chapters and articles related to this topic
2-D Based Nanostructures and Their Machining Challenges
Published in Subhash Singh, Dinesh Kumar, Fabrication and Machining of Advanced Materials and Composites, 2023
K. Santhosh Kumar, Subhash Singh
An ion beam is employed to evaporate the substance and deposit a nanostructure on the substrate; hence, it is called an ion-assisted beam deposition (IAD). Sputtering, condensation, ion implantation, thermally desorbed deposition, and crystallization come under the IAD techniques. In the IAD process, the evaporation can be done by either directing the ion beam on to the substances or by adopting sputtering system [32]. The simple IAD system mainly consists of beam source to generate and focus the ion beams on to the substances, vacuum chamber (Kauffmann type) to process the required reactions, and a substrate to deposit a solid nanostructure. By adding the adequate amount of electrons, an unbiased ion beam is generated to bombard with positively charged ions. Bombarding of positive ions helps to avoid the dielectric material charging and promotes the conduction and non-conduction recipients [32–34].
Advanced Machining Processes and Operations
Published in V. K. Jain, Advanced Machining Science, 2023
In beam machining technology, the processes discussed above come under the category of TAMPs. They are good for macro- and micromachining but in general they are not used for nanomachining (or, more correctly for the creation of nanosize features). There is another beam technology process called Ion Beam Machining (IBM) in which material is removed practically atom by atom by a beam of ions. However, in my opinion, it does not fall in to the category of TAMPs because here the mechanism of material removal is not melting and/or vaporizing, but rather it is a kind of mechanical energy (force) of the ions which separates out an atom from the surrounding atoms when the energy of the hitting ion is more than the bonding energy of the atom [24–27].
Nanosensor Laboratory
Published in Vinod Kumar Khanna, Nanosensors, 2021
Semiconductor manufacturers today use ion implantation for almost all doping in silicon integrated circuits (ICs). What are the common implanted species? The most commonly implanted species are arsenic (As), phosphorus (P), boron (B), indium (In), antimony (Sb), germanium (Ge), nitrogen (N), hydrogen (H), and helium (He). Ion implantation works by ionizing the required atoms, accelerating them in the electric field, selecting the correct species using an analyzing magnet, and bombarding the substrate with the ion beam in a pre-calculated manner.
Probing the nature of soil organic matter
Published in Critical Reviews in Environmental Science and Technology, 2022
Zhe (Han) Weng, Johannes Lehmann, Lukas Van Zwieten, Stephen Joseph, Braulio S. Archanjo, Bruce Cowie, Lars Thomsen, Mark J. Tobin, Jitraporn Vongsvivut, Annaleise Klein, Casey L. Doolette, Helen Hou, Carsten W. Mueller, Enzo Lombi, Peter M. Kopittke
Technical background: Nanoscale secondary ion mass spectrometry (NanoSIMS) is an analytical technique that provides information of the microscale (∼50–100 nm spatial resolution) elemental and isotopic composition of a material (Herrmann et al., 2007; Hoppe et al., 2013; Mueller et al., 2013). A primary ion beam (either Cs+ or O−) is accelerated onto the sample surface which releases secondary ion particles. These ions are separated according to their mass to charge ratio in a sector mass spectrometer. The primary ion beam can be focused to a spot of sample to achieve a lateral resolution of up to 50 nm, with scanned area typically between 5 × 5 μm up to 30 × 30 μm (Mueller et al., 2012; Steffens et al., 2017).
Evolution of Rutherford’s ion beam science to applied research activities at GNS Science
Published in Journal of the Royal Society of New Zealand, 2021
John V. Kennedy, William Joseph Trompetter, Peter P. Murmu, Jerome Leveneur, Prasanth Gupta, Holger Fiedler, Fang Fang, John Futter, Chris Purcell
Lord Rutherford’s early research remains relevant more than 100 years later. Ion beam-based methods offer the ability to: 1/ analyse materials for every element of the periodic table, to ppm concentrations, and depth profile from a few nm to several microns; and 2/ modify and create new materials. His legacy lives on in his birth country at GNS Science, contributing to a wide variety of materials analysis and materials development for new technology development and new materials for a low carbon future.