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Nanofabrication Using Focused Ion Beam
Published in V. K. Jain, Advanced Machining Science, 2023
Bhaveshkumar Kamaliya, Rakesh G. Mote
The study of nanostructures and sub-nanometer-sized structures is of great interest today because of their novel applications and efficient performance. The FIB is widely used in the areas of fabrication, surface modification, and surface analysis. Nano/microscale photonic crystals, MEMS/NEMS devices, TEM sample preparation, 2D/3D micro/nanostructure fabrication, mechanical machining tools, biological tools, microfluidics, etc., are the applications where the fabrication capabilities of FIB have been utilized. Through the material removal and material deposition processes, milling (see Figure 9.2(a) and Figure 9.5(a)) and deposition (see Figure 9.2(b) and Figure 9.7(a)) are the two main direct writing functionalities of FIB for fabricating micro/nanostructures using material removal and material deposition processes [16]. In addition to these direct methods, ion beam-induced surface self-organization has also emerged as a promising nanostructuring strategy toward creating features of sub-nanometer to few nanometers in size.
Advances in Textured Cutting Tools for Machining
Published in Kishor Kumar Gajrani, Arbind Prasad, Ashwani Kumar, Advances in Sustainable Machining and Manufacturing Processes, 2022
Anand C. Petare, Neelesh Kumar Jain, I. A. Palani, S. Kanmani Subbu
The FIB machining process is frequently used in manufacturing semiconductor devices, microelectronics, high-resolution texturing/embossing, chip processing, repairing lithographic masks, and additive manufacturing. It facilitates high-precision milling and deposition, which makes it capable of fabricating micro- and nano-features on objects with a high resolution. [22]. It is a sputtering-based molecular manufacturing process in which the material removal takes place in the form of molecules or atoms from the workpiece surface. Figure 4.5 depicts the schematics of the working principle of the two-lens FIB process.
Optical Couplers
Published in Erich Kasper, Jinzhong Yu, Silicon-Based Photonics, 2020
A new kind of grating coupler made by relatively simple fabrication processes could obtain vertical light coupling [30]. Focused ion beam (FIB), which was used for a slanted grating structure, is a common tool for electronic device investigation and trimming. Use of gallium ions is standard in FIB. FIB is also useful for nanophotonics as it can be used to create complex 3D structures and accurate modification for nanostructures. However, it can introduce lattice damage and thereby high optical loss. Even the FIB with a low implantation dose causes an additive optical loss of 0.2–2 dB.
Effect of focused ion beam process parameter on Tin-Nickel-Copper micropillars microfabrication
Published in Materials and Manufacturing Processes, 2020
N. Syahira M. Annuar, Reza Mahmoodian, Mohd Hamdi Abd Shukor
Focused ion beam (FIB) machining for microfabrication is a highly advanced tool for patterning and drawing nano- and micro-structure due to its excellent degree of accuracy with a low resolution of ion milling.[10] The ion milling has acquired a direct or mask patterning at a specified area of the specimen, together monitoring of the milled area by SEM/FESEM imaging attached to the FIB machine.[11] Despite the highly precision structure produced by this type of microfabrication, the concept of ion milling had utilized the ion bombardment onto the surface specimen thus lead to a significant surface modification over the overall patterned structure.[12–16] Besides, another challenging issue in the micropatterning for multilayered sample is a sputtering effect contributed to different material removal by the ion milling.[17] Indeed, the preparation of the FIB ion milling specimen is uncomplicated, simple and free from wet chemistry.[14] An effective way to ensure ion bombardment without extensive divergence of ions can be achieved by adding additional tools to guide high ion beam current through self-focusing limit exit such as micro-glass capillary.[18] However, high ion beam current-induced more damage thus making it difficult for the application that required high-quality patterned structure, which is then considered to choose a suitable type of ion source.[19] The selection of commercial Ga ion source is preferred because it has outweighed the advantages of reasonably high ions mass for fairly rapid machining which lead to fine-milled patterned architecture, long lifetime source, robust, and low melting point in contrast with other type of ion beam source for FIB machining like xenon (Xe).[15,20]
A review of cutting tools for ultra-precision machining
Published in Machining Science and Technology, 2022
Ganesan G., Ganesh Malayath, Rakesh G. Mote
Ion beam machining (IBM) and focused ion beam (FIB) are used for preparing high-quality cutting edges. IBM uses an avalanche of ions of an inert gas which is accelerated in the vacuum environment toward the workpiece to remove material. FIB uses a gallium ion beam, which is focused on a small section of the workpiece using electrostatic lenses and deflection plates to remove material in a localized manner. Ion beam is used to sharpen single-point diamond tools (Miyamoto et al. 1990). IBM could sharpen the mechanically polished tools with an edge radius of 70 nm to a superior edge radius of 20–30 nm. However, when the ions impact the tool’s rake face, a negative land (facet) is formed near the cutting edge, making the tool blunt. Even though IBM proved that it could reduce the edge radius to 20 nm or less, facet and ripple formation are considered as the process’s major limitations. FIB machining technology is indispensable for developing various geometric tool varieties of ultra-precise tools on any material with nanoscale precision (Jain et al., 2020). Material removal happens when the surface atom receives the kinetic energy from the incident ion is sufficient to overcome the target material’s surface-binding energy. Ding et al. (2008, 2009) have developed a single cutting edge SCD tools with a cutting radius of 15 nm, 28 nm, and 40 nm using FIB. Sun and Luo (2013) developed the SCD tools for optic diffraction applications and machining the nanograting array. Picard et al. (2003) also used FIB to fabricate micro tools with high precision, as shown in Figure 35. However, edge rounding due to Gaussian distribution of the ion source, side wall tapering and swelling can diminish the quality of cutting tools when FIB is used for cutting edge preparation (Mote et al., 2017; Jain, 2022). Moreover, FIB can be performed on a very small area, and the machine cost is very high.