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Performance of Glubam Structural Members
Published in Yan Xiao, Engineered Bamboo Structures, 2022
When a member is subjected to pure axial load, the stress in its section can be taken as f = P/A. If a member is sufficiently long (slender), it may not develop its material strength-based capacity, AFy. The member may become unstable in maintaining its original shape and geometry under a smaller load in compressions (P < AFy = Pu). This phenomenon is called buckling, or instability. When a member buckles, its shape changes to a new geometric form, while the equilibrium is maintained under a specific load, which is the critical buckling load.
Plates and Stiffened Panels
Published in Ever J. Barbero, Introduction to Composite Materials Design, 2017
Finally, local buckling of the stiffener occurs when the walls of the stiffener (flange, web) buckle locally. Local buckling of the stiffener debilitates the panel and may lead to structural collapse. Open-section stiffeners are more susceptible to local buckling, mainly on the walls with free edges, but close-section stiffeners may also buckle locally. A filler (foam or honeycomb) may be used to prevent local buckling of closed-section stiffeners, but the possibility of water retention in the filler must be considered.
Longitudinally and Transversely Reinforced Plate Girders
Published in R. Narayanan, Plated Structures, 1983
When buckling occurs, unlike in a compression panel, it occurs as a diagonal band. This is essentially because the line of the buckle opposes the compressive stresses causing it and also because the remaining diagonal tension pulls the lines of the plate relatively straight in the direction along which it acts.
Thermo-mechanical performance of 3D-printed TC4 hierarchical lattice-truss-core sandwich structures in high temperature conditions
Published in Mechanics of Advanced Materials and Structures, 2023
Dong Wang, Xuanjia Zhang, Zhicheng Dong, Guowei Li, Heyuan Huang
The load–displacement curves of the six configurations obtained by physical tests and simulations at 25 °C and 350 °C are presented in Figure 5. Listing all curves would make the figures more chaotic and difficult to distinguish, so one of the three curves obtained by testing at each experimental condition that was closest to the mean of the ultimate load was selected. All the obtained curves from tests and simulations under the same conditions manifested a consistent trend and had a similar ultimate load, indicating that simulation values were conformed to test results; hence, the accuracy of the proposed numerical method was validated. Moreover, the load–displacement curves of the six configurations varied in the same way. In the initial loading stage, the load increased with displacement. A part of the structures started to buckle with the increasing load, causing the structural stiffness to decline and finally, leading to buckling failure. The peak loads of all six configurations at the high temperature decreased as compared to those at room temperature; thus, they were more vulnerable to failure at the high temperature.
Homogeneously aligned liquid crystal molecules on unidirectional buckle pattern of polyurethane films
Published in Liquid Crystals, 2018
Hae-Chang Jeong, Jonghoon Won, Ju Hwan Lee, Hyo-Young Mun, Dong Hyun Kim, Dong Wook Lee, Byeong-Yun Oh, Jeong-Min Han, Dae-Shik Seo
The fabrication of nano/microsized patterns is the most important technique for electronic devices [1–5]. In particular, buckle patterns, which are induced by an instability in the mechanical differences between adjacent layers, have been intensively investigated for several years because they have the potential to replace photolithography [6–8]. Among their many advantages, they are fabricated by a flexible process that allows for an easily controlled pattern size and orientation compared to the photolithography. To obtain buckle patterns, the underlying material should have elastic properties, and the upper layer should have stiff mechanical properties. This mechanical difference induces an in-plane compressive strain, thereby creating buckles on the surface. The obtained patterns have been recently exploited to fabricate photovoltaics, microlens arrays [9], flexible electronic devices [10], microfluidics [11] and diffraction gratings [12,13] and to align nanomaterials without lithography [14,15]. The size and orientation of the pattern could be appropriately controlled for their usage.