Explore chapters and articles related to this topic
Plasma Nanotechnology for Nanophase Magnetic Material Synthesis
Published in Sam Zhang, Dongliang Zhao, Advances in Magnetic Materials, 2017
Rajdeep Singh Rawat, Ying Wang
Industrial plasma applications can be broadly classified into two major areas. First is plasma processing, which typically involves the use of ions and reactive species in plasmas to modify the chemical and physical properties of a material surface. Plasma processing includes plasma activation, plasma etching, ion implantation, or surface modification through plasma functionalization, cleaning, and hardening. The second major area is plasma synthesis, which refers to the use of plasmas to drive or assist chemical reactions either to synthesize complex multicomponent compounds, alloys, or polymers starting from simpler starting precursors or to synthesize simpler material systems through the inverse processes of plasma decomposition of complex multicomponent materials. Plasma processing and synthesis of materials impact several large-scale manufacturing industries in the world, and foremost among them is the electronics industry. The several trillion dollar electronics industry uses plasma-based synthesis techniques for manufacturing very large-scale integrated (VLSI) microelectronic circuits (or chips) [3] and plasma processing for adhesion promotion of encapsulants, adhesives, and sealants by promoting their surface wetting properties. Plasma processing of materials is also a critical technology in the aerospace, automotive, steel, biomedical, and toxic waste management industries [3]. The use of plasma processing at atmospheric conditioning is fast becoming an intense area of research and application in plasma medicine.
Plasma Surface Modification and Etching of Polyimides
Published in Malay K. Ghosh, K. L. Mittal, Polyimides Fundamentals and Applications, 2018
Frank D. Egitto, Luis J. Matienzo
Under certain circumstances, plasma processing is an attractive alternative to other techniques of coating, etching, and modification. Plasma deposition processes can be used to coat substrates at relatively low temperatures. Plasma processes are “dry,” in some cases eliminating the need for undesirable wet chemical etching processes and the associated waste disposal problems. Plasma etching processes can be highly directional, enabling formation of small features not attainable with isotropic (equal in all directions) wet-chemical etching processes.
Parametric optimisation of plasma polishing process using response surface methodology
Published in Surface Engineering, 2023
Hari Narayan Singh Yadav, Manas Das
The current research article aims to establish a non-contact finishing process to improve the surface quality and remove the strained layer of fused silica while achieving the required surface finish. It removes the material from the surface and subsurface layer without any redeposition of contamination during plasma processing. The novelty of the present method combines the advantage of low-pressure plasma etching by ions having isotropic material removal on the substrate surfaces and the benefit of an APPP, for instance, chemical etching rather than physical bombardment by species. This method attains a defect-free, very fine-polished surface on an optical substrate. The present article focuses on the effect of input parameters, for instance, RF power, pressure ratio (SF6/O2), and total pressure of the process chamber on output responses, i.e. MRR and % change in surface roughness (% ΔRa). The process parameters (processing time and gas composition (He:(SF6 + O2))) have been kept constant during all experiments. An experimental analysis is performed to determine significant parameters and their influence on MRR and % ΔRa using the response surface method (RSM). The RSM model is experimentally validated at the optimum parameter condition for % ΔRa and MRR. Furthermore, the microstructure and chemical compositions of the fused silica are revealed by FESEM and EDX analysis, respectively, before and after processing.
Atmospheric pressure plasma deposition of silver nanoparticles on bark fabric for bacterial growth inhibition
Published in The Journal of The Textile Institute, 2023
Ronan Q. Baculi, Giovanni M. Malapit, Leah E. Abayao
Cold plasma is a fitting candidate for nanoscale surface modification of natural or synthetic polymeric materials such as textiles. Cold plasma is characterized by having electrons with relatively high temperatures but their atomic and molecular species are at near ambient temperature making them suitable for pre-treatment and finishing of textile fabrics without affecting their bulk properties (Hong & Sun, 2008). Plasma processing can generate desirable surface modifications which include surface activation, surface etching, cross-linking, chain scission, de-crystallization, and oxidation process. In addition, it improves the surface reactivity of textiles without the use of precursor, reducing agent or dispersing agent which results in an increased adhesion making the textiles suitable for antimicrobial finish (Leroux et al., 2006; Mun et al., 2020). In this study, we generated non-thermal plasma using an atmospheric pressure plasma jet (APPJ) setup that produces low-pressure plasma with temperatures from 25° C − 200° C (Ocampo et al., 2018).
Evolution in the surface modification of textiles: a review
Published in Textile Progress, 2018
Ayoub Nadi, Aicha Boukhriss, Aziz Bentis, Ezzoubeir Jabrane, Said Gmouh
Plasma, commonly considered as the fourth state of matter, is defined as an ensemble of charged, excited and neutral species, including some or all of the following: electrons, positive and negative ions, atoms, molecules, radicals and photons. Plasma treatment is an environmentally-friendly process technology, producing an extremely low level of industrial by-products, especially when compared to traditional wet-chemical treatments [58]. Thousands of research papers are published every year on plasma technology, revealing the vast possibilities offered by this relatively new field. A common theme in the application of plasma processes is surface treatment. Indeed, plasma processing is a technology used in a large number of industries, such as automotive, food packaging, biomedical, polymer manufacturing, solar energy and the textile industry. The mixture of species of which plasma is composed is highly complex, and in general all of these species can interact with the textile surface. Consequently, plasma technology is applied to introduce functionalities to fabrics such as, antimicrobial activity [50–55], hydrophobicity and hydrophilicity [56–62], flame retardancy [63–65], UV-protection [66] and improvement of aramid fibre III (poly-p-phenylene-benzimidazole-terephthalamide) interfacial adhesion with the matrix in composite materials [67, 68].