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Cleaning Processes in Plasma
Published in Radko Tiňo, Katarina Vizárová, František Krčma, Milena Reháková, Viera Jančovičová, Zdenka Kozáková, Plasma Technology in the Preservation and Cleaning of Cultural Heritage Objects, 2021
Radko Tiňo, Katarina Vizárová, František Krčma, Milena Reháková, Viera Jančovičová, Zdenka Kozáková
From a practical point of view, ‘plasma cleaning’ is the removal of impurities and contaminants from surfaces through the use of an energetic plasma created from gaseous species. A plasma cleaning system allows the efficient cleaning of a surface without having a negative impact on other properties of the surface. Over the past few decades, the efficiency of plasma cleaning has been recognized, and used for a variety of industrial pre-processing cleaning of materials. Knowledge and experience from these applications can be successfully used in the protection of CH objects. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen, are often used.
Plasma cleaning under low pressures based on the domestic microwave oven
Published in Journal of Microwave Power and Electromagnetic Energy, 2021
Li Wu, Zhuang Liu, Wencong Zhang, Xi Feng
Cleaning the surface of the samples is an important and indispensable step in many industry applications, such as in semiconductors and machinery (Korner et al. 1995; Li et al. 1997; Hsieh et al. 1999; Cherenda et al. 2014; Changming et al. 2018). Until now, various methods, such as solution cleaning, plasma cleaning and ultraviolet technique, have been employed for material surface cleaning processes in different applications. Due to its merits like environmentally friendly, nondestructive and efficient, plasma cleaning has drawn widespread attention in the academic community and shows great potential in the industry (Petasch et al. 1997). At present, there are a lot of researches on plasma cleaning of different material surfaces, such as silicon substrate surfaces (Hsu et al. 1991), large-size glass substrates (Kim and Park 2019), steel surfaces (Meletis et al. 2002) and various metal oxides (Fuchs 2009; Homola et al. 2012; Liu et al. 2018). They find that with plasma cleaning, undesirable substances can be completely removed even from sensitive surfaces, without any damage of the samples. It is believed that plasma cleaning has a bright future in wide domains.