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2 Nanoscale Film Deposited as an MOS Device Structure Using a Dense Plasma Focus Device
Published in James E. Morris, Krzysztof Iniewski, Nanoelectronic Device Applications Handbook, 2017
Another important problem with high-κ gate dielectric materials/stacks is the choice of technique used to deposit the dielectric film/stacks. This is very critical in determining the deposited film properties and the interface properties of gate dielectric with silicon substrate [1,3]. This chapter investigates the microstructure and electrical properties of HfO2 and La2O3/HfO2 gate stacks deposited using a novel deposition technique, namely the dense plasma focus (DPF) under optimized conditions. It further investigates other important parameters through electrical characterization like flat-band voltage (Vfb) and oxide-charge density (Qox) extracted from a highfrequency (1 MHz) C–V curve.
Plasma Nanotechnology for Nanophase Magnetic Material Synthesis
Published in Sam Zhang, Dongliang Zhao, Advances in Magnetic Materials, 2017
Rajdeep Singh Rawat, Ying Wang
The plasmas used in thermonuclear fusion research using magnetic, inertial, or hybrid confinement schemes use hot plasmas that have temperatures from a few to several tens of kiloelectron volts (refer to the enneagon box in Figure 4.1). Fusion research schemes often use auxiliary heating mechanisms to achieve extreme plasma temperatures, making matter to be in an almost fully ionized state. In this group of hot fusion plasmas, one can find the dense plasma focus (DPF) device, which was originally envisioned as an alternative magnetic fusion device on almost the highest side of plasma density. The DPF device is one of the plasma devices extensively investigated and presented in this chapter for the processing and synthesis of nanostructured magnetic materials.
EUV Lithography
Published in Bruce W. Smith, Kazuaki Suzuki, Microlithography, 2020
Stefan Wurm, Winfried Kaiser, Udo Dinger, Stephan Müllender, Bruno La Fontaine, Obert R. Wood, Mark Neisser
The dense plasma focus has been studied quite extensively for fusion applications [102,103]. For this type of the source, the electrodes have a coaxial geometry, and the discharge has two main phases. Initially, the current between the anode and the cathode is radially symmetric, and the Lorentz force rapidly drives the current away from the insulator and toward the end of the coaxial electrodes. Once the current lines extend beyond the end of the electrodes, they develop a strong axial component. At that point, a z-pinch develops in front of the electrodes with strong EUV emission [104].
Charged particles and x-ray emission studies on a dense plasma focus device
Published in Radiation Effects and Defects in Solids, 2020
S. R. Chung, R. A. Behbahani, C. Xiao
Short-lived, high-temperature and high-density plasma is produced in dense plasma focus (DPF) devices. In the process, pulses of intense x-ray radiation is emitted (1–3), as well as electron and ion beams (4,5), as a consequence of the acceleration and pinching of the plasma. A wide range of applications especially as a pulsed source, makes the DPF a good candidate for pulsed activation analysis such as lithography and microscopy (6,7).