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Recent Advancements in Microbial Degradation of Xenobiotics by Using Proteomics Approaches
Published in Vineet Kumar, Vinod Kumar Garg, Sunil Kumar, Jayanta Kumar Biswas, Omics for Environmental Engineering and Microbiology Systems, 2023
Neha Sharma, Smriti Shukla, Kartikeya Shukla, Ajit Varma, Vineet Kumar, Menaka Devi Salam, Arti Mishra
Halocarbons have different numbers of halogen in place of hydrogen atoms (e.g. Br, F, and I) Halocarbons include chloroform or trichloromethane (CHCl3), Ferons, trichlorofluoromethane (CCl3F), dichlorodifluoromethane (CCl2F2), chlorotrifluoromethane (CClF3), carbon tetrafluoride (CF4), and insecticides such as DDT, benzene hexachloride (BHC), and lindane (Jha et al. 2015).
Atomic, Molecular, and Optical Physics
Published in W. M. Haynes, David R. Lide, Thomas J. Bruno, CRC Handbook of Chemistry and Physics, 2016
W. M. Haynes, David R. Lide, Thomas J. Bruno
Substances containing carbon C Carbon Bromochlorodifluoromethane CBrClF2 Bromotrichloromethane CBrCl3 Bromotrifluoromethane CBrF3 Dibromodifluoromethane CBr2F2 Tetrabromomethane CBr4 CCl Chloromethylidyne Chlorotrifluoromethane CClF3
Electron ionisation cross sections of CF3Cl and CF2Cl2 molecules
Published in Molecular Physics, 2022
Pawan Kumar Sharma, Rajeev Kumar
Chlorotrifluoromethane (CF3Cl) also named chlorofluorocarbon-13 (CFC-13), R-13 or Freon 13, is a non-flammable, non-corrosive, one of the mixed halomethanes which are man-made substances used primarily as a refrigerant but now banned by the Montreal Protocol and when released in the environment, deplete the ozone layer highly, produce global warming and has a very long atmospheric lifetime (640 years) [4]. Dichlorofluoromethane (CF2Cl2) also named chlorofluoro-halomethane-12 (CFC-12), R-12 or Freon-12, is a colourless gas that depletes the ozone layer highly and also has enough long atmospheric lifetime (100 years). High symmetry and high electronegativity of molecule CF2Cl2 (X1 A1) provide it with several important technological applications like cleaner of the chemical vapour deposition chamber, as a solvent, as an etching gas with applications in plasma processing and semiconductor industry, as a refrigerant, a foam blowing agent, an aerosol propellant and as an additive in gaseous dielectric mixtures [4,5].