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Plasmonic Nanochips Development and Applications
Published in Volodymyr I. Chegel, Andrii M. Lopatynskyi, Molecular Plasmonics, 2020
Volodymyr I. Chegel, Andrii M. Lopatynskyi
Nanoimprint lithography is a nanopatterning technique that provides a tradeoff between fabrication throughput, precision, costs, and sample area, which allows eliminating drawbacks of scanning beam and colloidal lithographies for specific applications. This fast-developing technology provides means to replicate features on a hard or soft stamp in a thermoplastic or photocurable resist by embossing or molding. Subsequent deposition of a metal film on such a replica with or without further resist lift-off can be used to produce plasmonic structures resembling the stamp nanorelief for applications in chemical and biosensing. Among the advantages of NIL is the capability to create nanoreliefs over large sample areas in parallel mode with high pattern uniformity and low defect densities, which is crucial for mass production of reproducible sensor chips for biosensing instruments. Namely, NIL is capable of molding a variety of materials and pattern features with a sub-10 nm resolution on the cm2 area scale [132–134]. Another advantage of NIL is a wide range of nanoparticle shapes that can be fabricated using specially prepared reusable NIL stamps (Fig. 3.12) [135], which is important in biosensing applications to optimize the performance of plasmonic nanoparticle arrays.
Enabling Fabrication Technologies for Planar Waveguide Devices
Published in María L. Calvo, Vasudevan Lakshminarayanan, Optical Waveguides, 2018
Nanoimprint lithography involves a solid mold, for example, silicon or nickel. The process requires heating the surface polymer over its glass transition temperature, then embossing the pattern with the mold. Soft lithography involves the transfer of self-assembled monolayers using a flexible template. In order to improve the alignment process, an imprinting technique known as step-and-flash imprint lithography (S-FIL) using a rigid and transparent template was developed. Figure 7.7 illustrates the S-FIL process. A transparent mold of quartz is brought into contact with a sample surface previously coated with a monomer. Before removing the mold, the patterned monomer is exposed to UV light through the mold and the residual monomer is etched away (where pressed) before transferring the pattern onto the sample. This technique does not require hot and hard embossing, and is particularly suitable for good overlay accuracy.
Electron Beam Lithography for Biological Applications
Published in Yubing Xie, The Nanobiotechnology Handbook, 2012
Below the resolution limits of optical lithography, there are two commercial technologies available for patterning, each with a different application space. Nanoimprint lithography (Chou et al., 1996; Colburn et al., 1999; Hoff et al., 2004; Hua et al., 2004; McClelland et al., 2002) is closest in spirit to lithography as originally conceived in 1801. A high-resolution master stamp or template is fabricated using EBL, and the pattern is transferred to a polymer-coated wafer by a variety of means, including heat, pressure, and photocuring. The resolution of nanoimprint lithography appears to be effectively unlimited, with single carbon nanotubes being used as masters in the imprint process and successfully replicated (Hua et al., 2004). Compared to high-resolution photolithography, nanoimprint is at a disadvantage on throughput, overlay, and defects; it has the advantage for resolution and parity with flexibility (as with photolithography, nanoimprint requires a new template for each design change). Imprint lithography is a candidate in situations that require nanoscale patterning but cannot tolerate the conditions of EBL.
Parametric investigation of flexographic printing processes for R2R printed electronics
Published in Materials and Manufacturing Processes, 2020
Z. W. Zhong, J. H. Ee, S. H. Chen, X. C. Shan
Nanoimprint lithography (NIL) is emerging for printed electronics with low costs, high throughput and resolution patterning.[1–5] Key highlights of printed electronics include roll-to-roll (R2R) NIL, thin and flexible product form factor[6] and low-cost volume manufacturing. These enabled printed electronics to become a prominent technology in producing flexible and low cost electronics such as transistor,[7] radio frequency identification[8] and solar cells.[9] Flexible molds made from a polymer substrate can be used.[10] The polymer can influence the embossing process.[11,12] The properties of the film, mold and resin can establish the profiles of manufactured microstructures.[13,14]