China
Africa
Explore chapters and articles related to this topic
Approaches for Nanomaterial Lab Scale Synthesis and Manufacturing
Published in Dhiraj Sud, Anil Kumar Singla, Munish Kumar Gupta, Nanomaterials in Manufacturing Processes, 2023
Nidhi Sharotri, Deepali Sharma
E-beam lithography is another name known for electron-beam lithography and is capable of forming photomasks with superior patterning resolution. Additionally, when electrons are used in the technology then it is termed electron-beam (e-beam) lithography. The major benefit of electron-beam lithography is the formation of patterns of high resolution and is dependent on the scattering of electron in a resist film/substrate. When ions, such as H+, He2+, Li+ and Be2, are used, the process is known as focused ion-beam lithography.
Synthesis of Nanomaterials for Drug Delivery
Published in Vineet Kumar, Praveen Guleria, Nandita Dasgupta, Shivendu Ranjan, Functionalized Nanomaterials II, 2021
Hemant K. S. Yadav, Shahnaz Usman, Karyman Ahmed Fawzy Ghanem, Rayisa Beevi
The process of using an electron beam in order to generate patterns on the surface is known as electron beam lithography. This method allows making features in the sub-micrometer regime and is also a way to beat the diffraction limit of light.[42] Both wave-like and particle-like property is possessed by the electron and their wavelength is in the order of a few tenths of an angstrom. Hence diffraction considerations do not limit their resolution. The factor that will limit the resolution here is the back scattering from the underlying substrate and the forward scattering of electrons in the resist layer.[18]
Lithography
Published in Kumar Shubham, Ankaj Gupta, Integrated Circuit Fabrication, 2021
Electron beam lithography replaces the photons with an electron beam, and utilizes a different optical system for image formation known as direct writing between the source and the resist. Electron beam lithography process as shown in figure 4.17.
State of the Art of Nanoantenna Designs in Infrared and Visible Regions: An Application-Oriented Review
Published in IETE Technical Review, 2022
Priya Ranjan Meher, Abhiram Reddy Cholleti, Sanjeev Kumar Mishra
Electron beam lithography uses electrons to print patterns. First, it starts with a substrate like silicon, where we apply the pattern and then an EBL resist is coated on the substrate. After this, the substrate is loaded into the EBL instrument. Now, the electron source which is a part of the instrument emits electrons and then the lens system presented in it focuses the beam. At last, the deflectors control the beam onto the substrate according to the design. In the next step, the substrate will be submerged into a developer (chemical bath) to dissolve the resist material that was exposed to the electron beam. Figure 9(b) represents the schematic diagram of EBL.