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Recent Trends in Plasma Chemistry and Spectroscopy Diagnostics
Published in Tanmoy Chakraborty, Lalita Ledwani, Research Methodology in Chemical Sciences, 2017
Plasma chemistry plays an important role in most plasma-processing systems and applications. The industrial plasma applications range from nonthermal to thermal plasmas. In nonthermal plasma applications, the highly active species of plasma play an important role, whereas in thermal plasma applications, the higher temperature properties of the plasma control the chemistry.1 In fact, plasma has become an important element and has touched many aspects of our lives. For example, people are well aware of plasma TV, plasma thrusters, and fluorescent lamps, as well as popular-culture concepts such as plasma guns and plasma shields (Ref. [2] and references therein). Cell phones, computers, and other modern electronic devices are also manufactured using plasma-enabled chemical processing (Ref. [2] and references therein). Most of the synthetic fibers used in photomaterials, clothing, and advanced packaging materials are also treated using plasmas.3 A significant amount of clean water in the world is purified using ozone-plasma technology.4 Many different tools and special surfaces are plasma-coated to protect and provide them with new extraordinary surface properties. The developments in plasma chemistry are enabling tremendous growth in a variety of applications for environmental remediation, manufacturing, therapeutic, preventive medicine, etc.5,6 The motivation for this chapter is to bring out the foundational understanding of some of the physical and chemical aspects associated with both thermal and nonthermal plasmas. Efforts have also been made to discuss the recent trends in plasma chemistry and spectroscopy diagnostics.
Overview of Liquid-Metal PFC R&D at the University of Illinois Urbana-Champaign
Published in Fusion Science and Technology, 2023
D. Andruczyk, R. Rizkallah, D. O’Dea, A. Shone, S. Smith, B. Kamiyama, R. Maingi, C. E. Kessel, S. Smolentsev, T. W. Morgan, F. Romano
where B, C, D, μ, and σm are fitting parameters. Using as a reference one of the intermediate-power shots from the Magnum-PSI campaign where the heat flux is 6 MW·m−2 on the solid target and 4.5 MW·m−2 on the lithium target, some numerical values can be obtained. The dissipated heat by lithium for this shot is 1.5 MW·m−2 or 265 W, knowing the area of the used targets. The lithium surface temperature at this power setting was measured via an infrared camera to be 650°C. This gives a maximum evaporative heat flux of W, assuming no redeposition. We can assume that at the temperatures of the Magnum-PSI, losses via sputtering are low and lithium evaporation and sputtering will combine to dissipate the 45 W computed with the zero redeposition assumption. This leaves a total of W, at least, to be dissipated via plasma chemistry.
Decomposition of n-hexane using a dielectric barrier discharge plasma
Published in Environmental Technology, 2021
Youn-Suk Son, Junghwan Kim, In-Young Choi, Jo-Chun Kim
Figure 3 shows the removal efficiency of n-hexane according to different background gases in the DBD plasma process. The removal efficiencies of the three background gases (N2: 68% to 91%, He: 76% to 94%, air: 84% to 100%; in the order of air > He > N2) were increased with increasing SED (specific energy density (J L−1)). He is recognized as an inert gas. However, it was reported that He has an effect on plasma chemistry by transferring energy from its metastable states to oxygen and n-hexane and by increasing the average electron energy in the plasma [36]. Our result consistent with that obtained by Yan et al. [19]. They reported the decomposition efficiency of n-hexane by the type of background gas in gliding arc discharge to be in a different other, air > Ar > N2 [19]. Yan et al. [19] mentioned that the removal efficiency of hexane in nitrogen is lower than in argon because of the electron consumed by the dissociation of nitrogen. However, our result was different from the result obtained by the electron beam (EB) [37]. They reported that the removal efficiency of n-hexane under He atmosphere is considerably lower than those under other background gases such as air, O2, and N2. This difference is considered to be due to the densities and properties of the ions and radicals generated due to the difference in electron energetic levels (DBD plasma (4–5 eV) and EB (300–750 keV)) [19].
Fluoropolymer adhered bioinspired hydrophobic, chemically durable cotton fabric for dense liquid removal and self-cleaning application
Published in Surface Engineering, 2021
Sourav Mondal, Sukanta Pal, Ananya Chaudhuri, Jayanta Maity
In a review of the literature, the strategies used to develop the surface roughness of cotton fabrics for fabricating water repellent cotton fabric could be categorized into several general approaches. The incorporation of inorganic particles on a textile surface via sol–gel chemistry [18,19], dip coating [20], layer-by-layer [21] coating techniques, etc., were reported. Another approach focusses on the growth of nanostructures via reactions between alkyl trichlorosilane and hydroxyl groups on the surface of the cotton fabric [22]. The production of the rough textile surface was also reported using the polymerization of fluorocarbon compounds by various surface chemistry techniques. Examples of these strategies include atom transfer radical polymerization (ATRP) [23], nitrene chemistry via UV-irradiation [24], electrospinning and chemical vapour deposition techniques [25], and plasma chemistry from fluorocarbon compounds [26]. Fluorocarbon-based products were found to enhance oil and water repellency by lowering surface energy with increasing surface roughness [27]. Therefore, at present, the impregnation of textiles with fluorine containing polymer dispersions or solutions is the most applied technique. The increase in the number of fluorine–carbon bonds in the functional structure decreases the surface energy with increasing hydrophobicity [28].