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Methods of Thin Film Deposition
Published in Fredrick Madaraka Mwema, Tien-Chien Jen, Lin Zhu, Thin Film Coatings, 2022
Fredrick Madaraka Mwema, Tien-Chien Jen, Lin Zhu
Vacuum coating processes take place in three stages: (1) the generation or production of the material to be deposited, (2) transportation of the material through a vacuum to a substrate, and (3) condensation of the generated material onto the growing film on a substrate. The vacuum in these processes maintains a mean free path that reduces gaseous contamination and enhances the deposition efficiency of the generated material. Ion plating is a vacuum form of the PVD process in which there is a concurrent bombardment of substrates and target material by energetic particles of the size of an atom. Ion plating was first outlined in 1963 where it was used to enhance film adhesion to improve surface coverage [34]. Since then, the technique has been improved and is finding application in corrosion protection, tribology, and electrical contacts.
Thin Film Growth, Structure, and Properties
Published in Fredrick Madaraka Mwema, Esther Titilayo Akinlabi, Oluseyi Philip Oladijo, Sputtered Thin Films, 2021
Fredrick Madaraka Mwema, Esther Titilayo Akinlabi, Oluseyi Philip Oladijo
Ion plating is an improvement of the evaporation method in which the evaporated materials of the target are ionized by passing them through a plasma before they get deposited onto the substrate (Figure 1.9). This process increases the energy density such that the atoms can stick onto the substrate at higher adhesion than in the normal evaporation process and as such, the process is used to prepare hard thin films for surface protection such as wear resistance, corrosion, and vibration damping properties [60–64]. Similar to other PVD methods, parameters such as the energy of neutrals and ions hitting the surface of the films during deposition significantly affect the quality and performance of the thin films [65]. Other important parameters for this process include total pressure inside the deposition chamber, the ion arc current, voltage bias, pulse frequency, partial process pressure, duty ratio, flowrates and pressures of the reactive gases, and axial magnetic field [66]. Due to improved adhesion exhibited by ion plated thin films, the process could be suitable for multilayer film preparations. Such films have attractive applications in extreme conditions such as in surface protection of energy storage vessels, surface cladding of engine parts, and application as coatings in petrochemical pipelines, vessels, etc.
Surface Phenomena
Published in Pramod K. Naik, Vacuum, 2018
This is a process of applying materials to a target using an ion beam. The ion source employs materials in the form of a gas, an evaporated solid, or a solution (liquid). The plasma/gas discharge system can also be used to bombard the target by accelerated ions. The ions are then accelerated, focused or deflected using high voltages or magnetic fields. Deceleration at the target can be employed to control the deposition energy ranging between a few eV up and a few keV. Molecular ion beams are deposited on the surface at low energy. Aisenburg 74 has discussed mechanisms in the process of ion plating. The ion plating process was first described in the technical literature by Mattox 75. Ion plating is used to deposit hard coatings of compound materials on tools, adherent metal coatings, optical coatings with high densities, and conformal coatings on complex surfaces.
Crack resistance enhancement of gradient bias TiN/Ti multilayer coating by Ti sputtering
Published in Surface Engineering, 2021
Zhihao Fang, WeiFeng He, Jiao Chen, Danyang Sun, Guangyu He
Sand erosion is a common material failure mode that severely damages aeroengine blades, thereby reducing the service life and aerodynamic efficiency of aeroengine [1–3]. As surface engineering technology developed, depositing a protective coating on substrates emerged as an effective method for enhancing the anti-erosion performance of compressor blades. To date, TiN-based coatings are the most widely employed industrial erosion resistance coatings for aeroengines [4,5]. However, TiN monolayer coating exhibits poor anti-erosion resistance at high erosion angle for brittle fracture. It is found that multilayer TiN-based coatings are believed to have higher fracture resistance than TiN monolayer coating due to the lower elastic modulus of Ti layer, crack deflection, and crack-tip shielding by the interfaces [6,7]. During ion plating, ions bombard the substrate and the surface of coating continuously under the acceleration of the negative bias electrical field. Negative bias is a crucial parameter that determines the value of ions bombardment energy since high ion energies may cause ion sputtering whereas low ion energies will lead to deposition [8]. Highly energetic ion sputtering was proved as an effective method for clearing the loose texture, enhancing diffusion, and creating graded interfaces [9,10]. Therefore, TiN/Ti coatings with Ti interlayer deposited under gradient bias should have a higher adhesion between interlayers and toughness compared to traditional TiN/Ti coatings. However, there are little works that focus on the effect of Ti ion sputtering on the failure mechanism of gradient bias TiN/Ti coatings.
Review on the Preparation and High-Temperature Oxidation Resistance of Metal Coating for Fuel Cladding Zirconium Alloys
Published in Nuclear Science and Engineering, 2023
Ling Sun, Yuchen Xiao, Weijiu Huang, Baifeng Luan, Baoan Wu, Huiyi Tang
Ion plating is a technology that makes use of arc evaporation targets to generate gas ions and that deposits gas ions on the surface of the substrate to achieve coating technology, mainly including arc ion plating, multiarc ion plating, reactive ion plating, etc.[48–52] The ion plating technique is easy to operate. The deposited film is dense and has strong adhesion to the substrate. Arc ion plating has the advantages of good coating quality, high deposition rate, strong diffraction, and large-area deposition.[53,54]